DAS Exceeds SEMI GHG Benchmarks
DAS TILIA achieves over 99.9% removal efficiency for greenhouse gases.
TILIA Exceeds SEMI Benchmarks with >99.9% Efficiency
DAS Environmental Expert GmbH reaffirms its leadership in sustainable semiconductor emissions control with independent validation showing that its TILIA abatement system achieves Destruction and Removal Efficiencies (DRE) exceeding 99.9% for CF₄ and other fluorinated greenhouse gases. This performance surpasses the targets defined in the 2024 SEMI SCC Whitepaper “Overview of F‑GHG and Nitrous Oxide Semiconductor Abatement Technologies,” which sets new industry benchmarks at a minimum DRE of >95% and an aspirational goal of >99%. TILIA proves that even higher efficiencies are not only technically feasible but deliver tangible sustainability and economic advantages.
Setting a New Standard: The Path to Net-Zero Emissions
“Systems like TILIA prove that it is not only possible but also economically rational to exceed the current industry benchmarks,” says Stephan Raithel, Chief Operating Officer Gas Treatment at DAS Environmental Expert GmbH. “With rising carbon taxes and tightening sustainability targets, investing in high-efficiency abatement translates directly into operational and financial benefits.”
The global semiconductor industry emits thousands of tons of CF₄ annually — a gas with a Global Warming Potential (GWP) of 7,390. While current practice often aims to meet the SCC-recommended minimum DRE levels, only abatement systems consistently operating above 99.9% will allow the industry to reach its net-zero ambitions.
The SEMI SCC Whitepaper highlights that achieving these ultra-high efficiencies is essential to the industry’s sustainability roadmap and requires widespread adoption of next-generation abatement technology. With TILIA, DAS Environmental Experts sets a new industry standard — delivering verified “Best in Class” performance and enabling semiconductor manufacturers worldwide to drastically reduce their greenhouse gas footprint.
