SALIX - Removes Contaminants from Single-Wafer Cleaning Processes
The SALIX gas scrubber was developed to meet new requirements for wet chemical cleaning processes (wet clean technology) in the semiconductor industry.
SALIX – A Compact and Flexible Alternative to Switching Boxes
SALIX has been developed as an alternative to the application of switching boxes. The advantages compared to the switching-box concept are smaller and less complex exhaust-piping, smaller footprint and higher flexibility for process changes. Detailed background is available in our case study on wet bench processes in the semiconductor industry.
Point-of-Use Waste Gas Treatment for Wet Cleaning Processes with SALIX
SALIX – Local waste gas treatment for chemical wet cleaning processes
The SALIX product family comprises compact, high-performance systems for local waste gas treatment in chemical wet cleaning processes with high gas throughputs. The solutions are specially designed to efficiently remove water-soluble gaseous compounds such as alcohols, water-soluble solvents, acids and ammonia. They also enable the reliable separation of particles, salts and droplets from the exhaust gas stream.
Typical areas of application are single-wafer wet cleaning processes, where stable and clean exhaust air conditions are crucial. SALIX systems are designed to enable particularly long maintenance cycles of over a year, thus ensuring high system availability.
The product family includes SALIX, SALIX MINI and SALIX MICRO – tiered solutions that offer optimum performance in the smallest of spaces, depending on space requirements, process requirements and integration level.
Optimise Your Waste Gas Treatment with SALIX
The system reliably treats isopropyl alcohol (IPA), ammonia and hydrogen fluoride from waste gases from single wafer clean tools.
SALIX – Technical Data and Configuration Options
SALIX (wet)
The waste gases are fed by up to twelve separate inlets into pre-scrubber using spray nozzles which eliminates any clogging at the input. The waste gases pass into the first scrubber stage and flow upwards through the first scrubber column filled with packing material. The column is supplied with the scrubbing liquid via spray nozzles. Due to the large surface of the packing material and the counter flow principle the optimal absorption of the waste gases is possible.
In the second stage a different scrubbing liquid is used. A demister is used to prevent the liquids from the two stages from mixing. The second scrubbing liquid allows an alternative chemistry to be used and so optimise the scrubbing of the waste gases. Ingredients of waste gases, which have not reacted in the first scrubber stage, can be better absorbed in the second scrubber stage. After the deposition of residual moisture of the gas flow in a demister the residual gases meet the strict standards of German air pollution law (TA Luft).
